Effects of N_2 Addition on Aluminum Alloy Etching in Inductively Coupled Plasma Source

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Effects of N_2 Addition on Aluminum Alloy Etching in Inductively Coupled Plasma Source
Bowing Profile Induced by Ion Implant Damage during Silicon Gate Etching
Role of O_2 in Aluminum Etching with BCl_3/Cl_2/O_2 Plasma in High Density Plasma Reactor
Novel Structure for Reduced Operating Voltage in Fringe-Field Switching Mode with Negative Liquid Crystal
The Electro optic Characteristics of Multi-Cell Gap Fringe-Field Switching Mode
Analysis of Improved Transmittance in Fringe-Field Switching Mode Using Positive Liquid Crystal Incorporated with Chiral Dopant
Thickness Dependence of the Epitaxial Structure of Vanadyl Phthalocyanine Film
Fabrication of 1×4 Optical Switch with Gain Using Dual InGaAsP/InP Laser Diode Amplifier
Comparison of Fe- and p/n/p-Doped InP as a Current Blocking Layer for Monolithically Integrated InGaAsP/InP Laser Diodes with Passive Waveguides
Optical Properties of Cd_2GeSe_4 Single Crystal
Epitaxial Growth of GaN on LaAlO_3(100) Substrate by RF Plasma Assisted Molecular Beam Epitaxy
Molecular Orientation and Switching Behavior in Antiferroelectric Liquid Crystals Studied by Polarized Raman Scattering
Effects of Gas Species on Charging Induced Tungsten Plug Corrosion during Post Metal Etch Process
Dependence of Off-Diagonal Components of χ^ on Substrate Temperature of Epitaxially Grown Vanadyl Phthalocyanine Films
Effects of Macroscopic Pattern Density and O_2 Addition on Chamber Stability during Silicon Nitride Layer Etching in UNITY II-IEM Plasma Source
Role of O2 in Aluminum Etching with BCl3/Cl2/O2 Plasma in High Density Plasma Reactor

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