Role of O_2 in Aluminum Etching with BCl_3/Cl_2/O_2 Plasma in High Density Plasma Reactor

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Effects of N_2 Addition on Aluminum Alloy Etching in Inductively Coupled Plasma Source
Bowing Profile Induced by Ion Implant Damage during Silicon Gate Etching
Role of O_2 in Aluminum Etching with BCl_3/Cl_2/O_2 Plasma in High Density Plasma Reactor
Effects of Gas Species on Charging Induced Tungsten Plug Corrosion during Post Metal Etch Process
Role of O2 in Aluminum Etching with BCl3/Cl2/O2 Plasma in High Density Plasma Reactor

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