Lee Won | System Ic R & D Center Hyundai Electronics Industries Co. Ltd.

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概要

• 同名の論文著者
• System Ic R & D Center Hyundai Electronics Industries Co. Ltd.の論文著者

関連著者

• Lee Won

  System Ic R & D Center Hyundai Electronics Industries Co. Ltd.

• Lee Won

  System Ic R&d Center Hynix Semiconductor Inc.

• Baek Kye

  System IC R & D Center, Hyundai Electronics Industries Co., Ltd.

• Beak Kye

  System Ic R&d Center Hynix Semiconductor Inc.

• Park Changwook

  System Ic R&d Center Hyundai Electronics Industries Co. Ltd.

• Lee Won

  System Ic R&d Center Hyundai Electronics Industries Co. Ltd.

• Kim K

  Hynix Semiconductor Inc. Chungchongbuk-do Kor

• Kim K

  Hynix Semiconductor Inc. Chungchongbuk‐do Kor

• Lee W

  Hynix Semiconductor Inc. Cheongju‐si Kor

• Park Kun

  System Ic R&d Center Hynix Semiconductor Inc.

• Kim Kil

  System IC R & D Center, Hyundai Electronics Industries Co., Ltd.

• Shin Kang

  System IC R & D Center, Hyundai Electronics Industries Co., Ltd.

• Park Chagwook

  System IC R & D Center, Hyundai Electronics Industries Co., Ltd.

• Beak Kye

  System IC R&D Center, Hyundai Electronics Industries Co., Ltd.

• Park Changwook

  System IC R&D Center, Hyundai Electronics Industries Co., Ltd.

• KOHAMA Keiichi

  Institute for Molecular Science

• Shin K

  System Ic R&d Center Hynix Semiconductor Inc.

• Park Chagwook

  System Ic R & D Center Hyundai Electronics Industries Co. Ltd.

• Park Changwook

  System IC R&D Center, Hyundai Electronics Industries Co., Ltd.,

• Baek Kye

  System IC R&D Center, Hyundai Electronics Industries Co., Ltd.,

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著作論文

• Effects of N_2 Addition on Aluminum Alloy Etching in Inductively Coupled Plasma Source
• Bowing Profile Induced by Ion Implant Damage during Silicon Gate Etching
• Role of O_2 in Aluminum Etching with BCl_3/Cl_2/O_2 Plasma in High Density Plasma Reactor
• Role of O2 in Aluminum Etching with BCl3/Cl2/O2 Plasma in High Density Plasma Reactor

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