Dry Liftoff Method by Sublimation of Molybdenum Oxide
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概要
- 論文の詳細を見る
A new liftoff method is proposed in which the film to be lifted-off is deposited on a molybdenum patter. After the deposition, liftoff is done by thermally oxidizing the molybdenum and sublimating the molybdenum oxide. One micro meter thick sputter-deposited silicon dioxide was successfully delineated by this dry liftoff method. Dry liftoff is possible in an oxigen ambient at a temperature of 700℃ or higher. The rate at which the molybdenum underneath the silicon dioxide is removed increases with the oxidation temperature and is typically 30 μm/min at 900℃.
- 社団法人応用物理学会の論文
- 1983-09-20
著者
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Yachi T
Ntt Telecommunications Energy Laboratories
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Yachi Toshiaki
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Wada Tsutomu
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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YAMAUCHI Noriyoshi
Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Wada Tsutomu
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Yamauchi Noriyoshi
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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