Vacuum Shear Force Microscopy Application to High Resolution Work
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概要
- 論文の詳細を見る
A new technique-Vacuum Shear Force Microscopy (VSFM)-is introduced as a reliable method for maintaining a constant separation between a probe and sample. Elimination of many of the instabilities observed when applying the shear force mechanism to imaging under ambient conditions, allows for routine nanometer lateral and sub-nanometer normal resolution. In this paper this technique is applied, firstly, to the imaging of microtubules (biology) and, secondly, to the patterning and subsequent imaging of nanoscale metal lines (nanofabrication).
- 社団法人応用物理学会の論文
- 1999-07-15
著者
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Ohtsu Motoichi
Department Of Electrical Engineering And Information Systems The University Of Tokyo
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White J
Faculty Of Engineering University Telekom Multimedia
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YAMAMOTO Yoh
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology
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Yamamoto Yoshitsugu
Optoelectronic And Microwave Devices Laboratory Mitsubishi Electric Corporation
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Polonski Vitali
Department Of Applied Electronics Tokyo Institute Of Technology
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Ohtsu M
Department Of Electrical Engineering And Information Systems School Of Engineering The University Of
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OHTSU Motoichi
The University of Tokyo
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Kourogi M
Interdisciplinary Graduate School Of Science And Engineering Tokyo Institute Of Technology:japan Sci
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YAMAMOTO Yoh
Department of Applied Electronics, Tokyo Institute of Technology
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WHITE Jonathon
Faculty of Engineering, University Telekom Multimedia
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KOUROGI Motonobu
Department of Applied Electronics, Tokyo Institute of Technology
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Ohtsu Motoichi
Department Of Electrical Engineering And Information Systems School Of Engineering The University Of
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Ohtsu Motoichi
Department of Electrical Engineering and Information Systems, The University of Tokyo
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