The Most Essential Factor for High-Speed, Low-Power 0.35 μm Complementary Metal-Oxide-Semiconductor Circuits Fabricated on Separation-by-Implanted-Oxygen (SIMOX) Substrates

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A PLL-Based Programmable Clock Generator with 50- to 350-MHz Oscillating Range for Video Signal Processors (Special Issue on Multimedia, Analog and Processing LSIs)
The Most Essential Factor for High-Speed, Low-Power 0.35 μm Complementary Metal-Oxide-Semiconductor Circuits Fabricated on Separation-by-Implanted-Oxygen (SIMOX) Substrates
Collisional Quenching Rates by He, N_2 and CH_4 for the 4D_ State in SrII
Determination of Collisional Quenching Rate for the 4D_ State in SrII
Front-and Back-Interface Trap Densities and Subthreshold Swings of Fully Depleted Mode Metal-Oxide-Semiconductor Transistors Fabricated on Separation-by-Implanted-Oxygen Substrates
An Analytical Modeling of Three Primary Wiring Capacitance Components for Multi-Layer Interconnect Structure
Redistribution Process of Oxygen Atoms in Separation-by-Implanted-Oxygen (SIMOX) Substrates

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