Usefulness of Magnetic Neutral Loop Discharge Plasma in Plasma Processing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-05-15
著者
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ITOH Masahiro
ULVAC Japan, Ltd
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UCHIDA Taijiro
ULVAC Japan, Ltd
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Uchida Taijiro
Ulvac Japan Ltd
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Uchida Taijiro
Ulvac Japan Ltd.
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TANABE Masafumi
ULVAC Japan Co., Ltd.
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Tsuboi Hideyuki
Jmi Institute
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Tsuboi H
Kanagawa Univ. Yokohama Jpn
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Tusboi Hideo
ULVAC Japan, Ltd.
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Hayahsi Toshio
ULVAC Japan, Ltd.
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Hayahsi Toshio
Ulvac Japan Ltd.
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Tanabe Masafumi
Ulvac Japan Ltd.
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Itoh Masahiro
Ulvac Japan Ltd
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Itoh Masahiro
Ulvac Japan Ltd.
関連論文
- Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma
- Reactive Ion Etching of Al Alloy Films in a Rotating Magnetic Field
- Effects of Optical Confinement in Textured Antireflection Coating using ZnO Films for Solar Cells
- Usefulness of Magnetic Neutral Loop Discharge Plasma in Plasma Processing
- The Problem of Polarization in the Spectral Reflectance Measurement of Textured Crystalline Si Solar Cells
- Growth of Y_2O_2S:Eu Thin Films by Reactive Magnetron Sputtering and Electroluminescent Characteristics
- Characteristics of Y_2O_3:Eu/ZnS/Y_2O_3:Eu Red Light Emitting Electroluminescent Devices
- Structure and Luminescent Property of Y_2O_2S:Eu Thin Films Prepared by Magnetron Sputtering
- Gamma-Ray-Induced Absorption Bands in Pure-Silica-Core Fibers
- Gamma-Ray Induced Absorption Band at 770 nm in Pure Silica Core Optical Fibers
- Dry Etch Process in Magnetic Neutral Loop Discharge Plasma
- Observation of Induction Power Dependence on the Magnetic Neutral Loop Discharge Plasma Thermalization Phenomena
- Measurements of Parameters of Two-Electron-Temperature Plasma Produced by Electron Cyclotron Resonance
- Application of Radio-Frequency Discharged Plasma Produced in Closed Magnetic Neutral Line for Plasma Processing
- Plasma Production Using Energetic Meandering Electrons
- Collisionless Heating of Electrons by Meandering Chaos and Its Application to a Low-Pressure Plasma Source