Thin Film Transistors Made from Hydrogenated Microcrystalline Silicon
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-01-30
著者
-
Hwang H‐l
Tsing‐hua Univ. Hsin‐chu Twn
-
Hwang Heuy-liang
Department Of Electrical Engineering Tsing-hua University
-
HWANG Huey-Liang
Department of Electrical Engineering, Tsing-Hua University
-
Wang Kun-Chih
Department of Electrical Engineering, National Tsing-Hua University
-
Yew Tri-Rung
Materials Science Center, National Tsing-Hua University
-
HSU Kuo-Chiang
Department of Electrical Engineering, National Tsing-Hua University
-
CHEN Bor-Yir
Department of Materials Science and Engineering, National Tsing-Hua University
-
HSU Huey-Tzy
Department of Electrical Engineering, National Tsing-Hua University
-
Wang Kun-chih
Department Of Electrical Engineering National Tsing-hua University
-
Yew T‐r
National Tsing‐hua Univ. Hsinchu Twn
-
Chen B‐y
National Yunlin Polytechnic Inst. Yunlin Twn
-
Hsu Huey-tzy
Department Of Electrical Engineering National Tsing-hua University
-
Hsu Kuo-chiang
Department Of Electrical Engineering National Tsing-hua University
-
Hwang Huey-liang
Department Of Electrical And Power Engineering National Tsing Hua University
-
Chen Bor-yir
Department Of Materials Science And Engineering National Tsing-hua University
-
Yew Tri-rung
Materials Science Center National Tsing-hua University
関連論文
- Microcrystalline SiC Films Grown by Electron Cyclotron Resonance Chemical Vapor Deposition at Low Temperatures
- The Mechanism Responsible for a Low Electrostatic Discharge Failure Threshold of an Output Buffer Circuit with Low Current Drive Capability
- The Method to Optimize Gate Oxide Integrity, Hot Carrier Effect and Electro-Static Discharge without Sacrificing the Performance in Sub-Quarter Micron Dual Gate Oxide Process
- Analytical Model of Human Body Model Electrostatic Discharge Current Distribution and Novel Electrostatic Discharge Protection Structure
- A Novel Thin Gate-Oxide-Thickness Measurement Method by LDD (Lightly-Doped-Drain)-NMOS (N-Channel Metal-Oxide-Semiconductor) Transistors
- Very Low Temperature Deposition of Polycrystalline Si Films Fabricated by Hydrogen Dilution with Electron Cyclotron Resonance Chemical Vapor Deposition
- Thin Film Transistors Made from Hydrogenated Microcrystalline Silicon
- Ion Implanted Grating Type Si Solar Cells : B-6: SOLAR CELLS AND AMORPHOUS DEVICES
- Thermodynamic Considerations of Vapor Epitaxial Growth of CuInS_2/GaP heterojunctions : CHALCOPYRITES : THIN FILMS AND JUNCTIONS
- Characterization of Ultrathin Dielectrics Grown by Microwave Afterglow Oxygen and N_2O Plasma
- Simulation for the Microcrystalline Silicon Thin Film Transistors by Considering the Change of Acceptor-Like State and Microcrystal Grain Size Effect
- Simulation for the Microcrystalline Silicon Thin Film Transistors by Considering the Change of Acceptor-Like State and Microcrystal Grain Size Effect