Optical Properties of Plasma-Deposited Silicon-Oxygen Alloy Films

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概要

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• Hydrogenated amorphous silicon-oxygen alloy films are prepared by r.f. glow discharge decomposition of a SiH_4-CO_2 gas mixture. The optical properties of these films are discussed in terms of oxygen content. The Lorentz-Lorenz theory is the best approximation to the dependence of the refractive index on the oxygen content. The existence of silicon-rich and oxygen-rich phase is probable in the amorphous alloy films.

• 社団法人応用物理学会の論文
• 1990-04-20

著者

• HAGA Koichi

  RICOH Research Institute of General Electronics

• Watanabe Hideo

  Sendai National College Of Technology

関連論文

• Effects of rf Power and Substrate Temperature on Properties of a-SiN_x:H Films Prepared by Glow-Discharge of SiH_4-N_2-H_2
• Plasma-Enhanced Deposition of Silicon Nitride from SiH_4-N_2 Mixture
• Properties of Amorphous Films Prepared from SiH_4-N_2-H_2 Gas Mixture
• Properties of Photosensor with Amorphous Si:H/SiO_x:H Double-Layer Structure
• Properties of Silicon-Oxygen Alloy Films Prepared from SiH_4+CO_2 Gas Mixture
• A New Type of Heterojunction a-Si Photodiode for Lensless Contact-Type Image Sensor
• Wide Optical-Gap a-Si:O:H Films Prepared from SiH_4-CO_2 Gas Mixture
• Analysis of Composition of a-Si_Ge_x Alloy Films
• Optical Properties of Plasma-Deposited Silicon-Oxygen Alloy Films

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