Auger Electron Spectroscopy and X-Ray Diffraction Study of Interdiffusion and Solid State Amorphization of Ni/Ti Multilayers
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概要
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The process of interlayer diffusion and solid-state reaction in Ni/Ti multilayer films during annealing at 523-623 K has been investigated by Auger electron spectroscopy depth profiling (AESDP) and grazing incidence X-ray diffractometry. Samples were prepared by alternate evaporation of Ni and Ti on Si(111) substrate. The interdiffusion coefficients evaluated from the AESDP give reasonable values for the process. X-ray diffractographs show that the interfaces are altered into amorphous alloys, which induces a compressive internal stress within hcp Ti sublayers manifesting (002) preferred orientation, and couses characteristic shifts of the Ti Bragg peaks.
- 社団法人応用物理学会の論文
- 1992-07-15
著者
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TANAKA Kazuhide
Department of Metallurgy, Nagoya Institute of Technology
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YOSHINARI Osamu
Department of Materials Science and Engineering, Nagoya Institute of Technology
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Tanaka Kazuhide
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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Tanaka Kazuhide
Department Metallurgical Engineering Nagoya Institute Of Technology
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Yoshinari Osamu
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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TADAYYON Seyond
Department of Materials Science and Engineering, Nagoya Institute of Technology
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Tadayyon Seyond
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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