Interdiffusion in Pd/Ti Bilayer Films Studied by Auger Electron Depth Profiling
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概要
- 論文の詳細を見る
Interdiffusion processes in Pd/Ti bilayer films subjected to diffusion annealing at temperatures between 523 K and 623 K are studied. Changes of the concentration profile with annealing as revealed by Auger electron depth profiling are analyzed based on an error function analysis and the Boltzmann-Matano method to derive the intrinsic diffusion coefficients of Pd and Ti in the films. The diffusion coefficients obtained by the two methods agree well on the Ti-rich side. The temperature dependence of the diffusion coefficients is expressible by an Arrhenius-type equation, from which characteristic diffusion parameters are determined. A structural change associated with the interdiffusion is studied by grazing incidence X-ray diffraction.
- 社団法人応用物理学会の論文
- 1993-09-15
著者
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Tanaka Kazuhide
Department Metallurgical Engineering Nagoya Institute Of Technology
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Yoshinari O
Nagoya Inst. Technol. Nagoya Jpn
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Yoshinari Osamu
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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Tadayyon S
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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TADAYYON Seyed
Department of Materials Science and Engineering, Nagoya Institute of Technology
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