Resolution Limit for Optical Lithography Using Polarized Light Illumination
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概要
- 論文の詳細を見る
We studied the effects of polarized illumination using a phase-shifting mask and obtained periodic patterns near the resolution limit of i-line steppers. Our study focused on the basics of imaging in high-numerical-aperture (NA) optical stepper systems. We demonstrated the superior resolution of S-polarized illumination. We obtained 0.175 μm (=0.26λ/NA) lines and spaces using a phase-shifting mask at a wavelength of 0.365 μm and a numerical aperture of 0.54. We also study an "alternating aperture polarized mask" without a phase shifter.
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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Asai S
Nagoya Univ. Nagoya Jpn
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TAKIKAWA Masahiko
Fujitsu Laboratories Ltd.
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Asai Satoru
Fujitsu Limited
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Asai Satoru
Fujitsu Laboratories Ltd.
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HANYU Isamu
Fujitsu Laboratories Ltd.
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Hanyu I
Fujitsu Ltd. Kawasaki Jpn
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