Measurements of Plasma Controlled by Compressed Magnetic Field Magnetron Sputtering Technique

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概要

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• Measurements of the electron density of plasma and the magnetic field were carried out in a compressed magnetic field-magnetron sputtering system using a non-ferromagnetic material target. The electron density has its maximum in the region where the lines of magnetic force are parallel to the target surface, where the peak of erosion profile is observed. It was found that the peak position of the profiles of electron density and erosion could be controlled using this system.

• 社団法人応用物理学会の論文
• 1993-05-15

著者

• Ido S

  Saitama Univ. Saitama Jpn

• Ido Shunji

  Faculty Of Engineering Saitama University

• Hijikata Kenichi

  Mitsubishi Material Corporation Central Research Institute

• ISHIDA Yukihiro

  Faculty of Engineering, Saitama University

• Ishida Y

  Doshisha Univ. Kyoto

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