レーザー生成球対称Snプラズマからの極端紫外線(EUV)放射特性

概要

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A new research project on extreme ultraviolet (EUV) source development has been started utilizing resources of laser fusion research. The main task of the project is to provide a scientific basis for generating efficient, debris-free, high power EUV plasma source for production of semiconductor devices. Spherical solid-tin targets were illuminated uniformly with twelve beams from GEKKO XII to create spherical plasmas, and EUV emission spectra were absolutely measured. The highest conversion efficiency of 3% to 13.5nm EUV light in 2% bandwidth was attained at irradiance of around 5×10^<10>W/cm^2. The experimental data were well reproduced by a theoretical model taking power balance in the EUV plasma into consideration.
社団法人プラズマ・核融合学会の論文
2004-04-25