3. 親ガスおよびラジカルの気相解離過程 : 材料プロセス用フルオロカーボンプラズマに関する基礎研究の進展

概要

論文の詳細を見る
To investigate the mechanism of C_4F_8 dissociation, we made extensive measurements of electrons and radicals, as well as a theoretical study. These showed that the amount of light fluorocarbon radicals increased with increasing electron density. The dissociation of C_4F_8 was analyzed by using rate equations. The total dissociation rate coefficient of C_4F_8 was 1×10^<-8>cm^3/s, and CF_2 radicals were mainly generated from products of C_4F_8 dissociation. F was mainly generated from CF_2 by electron-impact dissociation and lost by pumping. We estimate that the C_2F_4 density was roughly comparable to the densities of CF and CF_3, and that the surface loss probability of C_2F_4 increased with increasing electron density.
社団法人プラズマ・核融合学会の論文
1999-07-25