X線シネ・センシトメリトにおけるベーリンググレアの影響

概要

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We have experienced variiations in the shape of the cinesensitometric curve when the exposure field is greatly altered. The veiling glare that arises from the scattering of x-ray photons, electrons, and light in the x-ray image intensifier(X-I.I.)depends on the size of the exposure field. Also, the effect adjacent chemicals that occurs during the develoment process depends on the size of the exposed area on film. The veiling glare in the X-I.I.and the adjacent chemical effect on cine film processing may be responsible for these phenomena. This study investigated the influences of veiling glare on the shape of the cinesensitometric curve. Results showed that the veiling glare of the X-I.I.acts to increase the sensitivity of the cinesensitometric curve on the X-I.I.whenthe exposed area on the X-I.I.is larger.
公益社団法人日本放射線技術学会の論文
1998-08-20