ポリイミド基板上に作製したFe-Al-O膜の磁気特性

概要

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Fe-Al-O films with high electrical resistivilities were prepared on polyimide substrates by reactive dc magnetron sputtering in Ar+O_2 gases and by RF co-sputtering of Fe and Al_2O_3.The relationship between the magnetic properties and resistivities of the films was investigated. The films prepared by RF co-sputtering exbited soft magnetic properties tpgether with high restivities of more than 10^3μΩcm. After anneeling at 380℃ for 1hour under a field of 1kOe, a coercivity of 1.5Oe, a resistivity of 2600μΩcm, an anisotropy field of 6Oe and a saturation magnetiztion of 10kG were obtained. These results are considered to be same values as the nano-granular structure reported on Fe-Al-O films prepared on glass substrates. On the other hand, the films prepared by reactive dc magnetron sputtering did not exibit such soft magnetic properties, because the nano-granular structure was disturbed by the presence of excess oxygen during film deposition.
社団法人日本磁気学会の論文
1998-04-15