熱分解法によるRuO_2-TiO_2薄膜の形成

概要

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Formation of thin film resistors employing thermal decomposition of metallo-organic compounds was studied. It was found that RuO_2-TiO_2 thin films showed good uniformity and thermal stability owing to the formation of solid solutions in this system. In these films, solid solutions with rutile structure were formed over the entire concentration range. When Ti concentration range was 0-50 mol%, the crystallographic structure of films showed a single phase of the solid solution. The solid solution was proved to be a metastable phase. It was revealed that the phase separation was dependent on impurities, which diffused from the substrate. Phase separation was observed above 700℃, if constituents of the substrate did not diffuse. On the other hand, if constituents of the glass substrate diffused into the film, the phase separation did not occur and the solid solution was stable above 700℃. As a result, a thin film resistor of good thermal stability and uniformity was obtained when a film with Ti concentration of 0-50 mol% was formed on a substrate and the constituents of which diffuse into it.
社団法人日本セラミックス協会の論文
1992-05-01