Low-temperature Development of In-plane and Interlayer Correlations in the Layered Compound Cu_<0.32>TiS_2
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概要
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Low-temperature X-ray intensity measurements have been performed on the development of in-plane and interlayer correlations of the layered compound Cu_<0.32>TiS_2. Two types of diffuse scattering, whose maxima appear at 1/3, 1/3, 1/2 and 2/3, 2/3, 1/2 (type I) and 1/2, 0, 1/2 and 0, 1/2, 1/2 (type II), coexist at room temperature. The type I diffuse maxima are gradually increasing with decreasing temperature and becoming constant below 150 K. The full width at half maximum (FWHM) of the intensity profile is almost equal to that of Bragg reflection below 150 K. This means that √<3> × √<3> R30° ordered structure of intercalated Cu atoms exists. The interlayer correlation length for the structure is about 45 A. On the other hand, weak and broad type II diffuse maxima are less temperature dependent, so that an enhancement of the degree of 2 × 2 in-plane order is not complete.
- 2003-11-15
著者
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KUSAWAKE Tomoko
Institute of Materials Science, University of Tsukuba
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Ohshima Ken-ichi
Institute Of Applide Physics University Of Tsukuba
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Kusawake T
Institute Of Materials Science University Of Tsukuba
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Kusawake Tomoko
Institute Of Materials Science University Of Tsukuba
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