低酸素分圧下で酸化したTiAlの角度分解XPSによる表面分析

概要

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Angle-resolved X-ray photoelectron spectroscopy has been used for investigating thin oxide layer formed on the surface of TiAl by oxidizing under an atmosphere of (10)^<-3> Pa at 1273K for 100min. The effective thickness of the thin oxide layer was estimated to be 5.0nm from the relationship between the concentration of titanium and aluminum and the take-off angle by coupling with a model, which consists of a contaminated layer and a titanium concentrated oxide layer on the matrix (the aluminum riched oxide layer). The present results suggest the predominant oxidation of titanium and the aluminum enrichment in the inner oxide layer. It is also interesting to note that oxidation states of taitanium and aluminum in the oxide layer appear to be lower than Ti(II) and Al(III), respectively, obtained from the Ti2p and Al2p intensity data as a function of the take-off angle by the curve fitting method.OxidationTitanium aluminideAngle-resolved X-ray photoelectron spectroscopy
東北大学の論文
1997-03-28