低エネルギー質量分離イオンビーム照射装置を用いたネオンによる金のスパッタ率の測定

概要

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The Au sputtering yields by Ne ions were measured in the range of low injection energy with a low-energy mass analyzed ion beam system. For the ion beam characterization, the mass and energy spectra of the Ne ion beams were measured with a plasma process monitor (Balzers, PPM421) and it was found the Ne beams were essentially monochromatic. The ion beam was injected into an Au thin film prepared on a quartz crystal microbalance (QCM) and its sputtering yield was evaluated from the Au mass decrement. It has been found that the measured Au sputtering yields by Ne ion beams in the energy range of 100-200 eV approximately agree with the previously reported corresponding values. The sputtering yields were also measured for the injection energies below 100 eV. The threshold energy for Au sputtering by Ne estimated from the low energy data is 35 eV.
日本真空協会の論文
2007-03-20