Repairing of Etching-Induced Damage of High-k Ba_<0.5>Sr_<0.5>TiO_3 Thin Films by Oxygen Surface Plasma Treatment

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2006-06-30

著者

• CHAO Chuen-Guang

  Department of Materials Science and Engineering, National Chiao-Tung University

• Lee Jain-tsai

  Department Of Materials Science And Engineering National Chiao-tung University

• Wu Wen-fa

  National Nano Device Laboratories

• TSAI Kou-Chiang

  Department of Materials Science and Engineering, National Chiao Tung University

• HSU Jwo-Lun

  National Nano Device Laboratories

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• Impacts of Cu/TaN Electrode on the Electrical Properties of Metal-insulator-metal (Ba,Sr)TiO_3 Thin-film Capacitors
• Improving Electrical Properties and Thermal Stability of (Ba,Sr)TiO_3 Thin Films on Cu(Mg) Bottom Electrodes
• Repairing of Etching-Induced Damage of High-k Ba_Sr_TiO_3 Thin Films by Oxygen Surface Plasma Treatment
• Formation Procedure and Microstructural Analysis of Pb_7Bi_3 (Pb-Bi) Alloy Nanowires
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• Improving Electrical Properties and Thermal Stability of (Ba,Sr)TiO3 Thin Films on Cu(Mg) Bottom Electrodes
• Repairing of Etching-Induced Damage of High-$k$ Ba0.5Sr0.5TiO3 Thin Films by Oxygen Surface Plasma Treatment

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