Novolak Resist Removal by Laser Irradiation (532nm) and Adhesion between Resist and Substrate
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-12-30
著者
-
HORIBE Hideo
Department of Materials Science and Engineering, Kochi National College of Technology
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FUJITA Masayuki
Institute for Laser Technology
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YOSHIKADO Akira
Toyo Precision Parts MFG Co., Ltd.
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NISHIYAMA Itsuo
Daipura-Wintes Co.
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