Development of Multilayer Resist Technology for Halftone Mask in Liquid Crystal Display Manufacturing
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概要
- 論文の詳細を見る
A halftone mask was used in a lithography process to reduce the number of steps required in liquid crystal display (LCD) manufacturing. Three thicknesses of resist films were produced using the halftone mask. Since the resist is exposed in the area where the sensitivity curve rises, a problem arises in that the thickness of the resist film fluctuates drastically when the exposure dose to the resist fluctuates slightly. We tried to stabilize the film thickness using two kinds of resists having different sensitivities. We used a low-sensitivity resist as a lower layer and a high-sensitivity resist as an upper layer. However, it was not possible to produce a stable film thickness because the two resists blended at the interface. Therefore, we added an aqueous polymer solution as an intermediate layer between the resists which were dissolved in a solvent. This solved the blending problem and a stable film thickness was obtained.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-15
著者
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HORIBE Hideo
Department of Materials Science and Engineering, Kochi National College of Technology
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Takamatsu Shinya
Department of Materials Science and Engineering, Kochi National College of Technology, 200-1 Monobeotsu, Nankoku, Kochi 783-8508, Japan
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Ichikawa Tomokazu
Department of Materials Science and Engineering, Kochi National College of Technology, 200-1 Monobeotsu, Nankoku, Kochi 783-8508, Japan
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Horibe Hideo
Department of Materials Science and Engineering, Kochi National College of Technology, 200-1 Monobeotsu, Nankoku, Kochi 783-8508, Japan
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Horibe Hideo
Department of Applied Chemistry, Kanazawa Institute of Technology, Hakusan, Ishikawa 924-0838, Japan
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Horibe Hideo
Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University
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