Plasma-Enhanced Chemical Vapor Deposition Growth of Fluorinated Amorphous Carbon Thin Films Using C_4F_8 and Si_2H_6/He for Low-Dielectric-Constant Intermetallic-Layer Dielectrics

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-07-15

著者

• SHIN Jang-Kyoo

  Department of Electronics, Kyungpook National University

• Shin Jang-kyoo

  Department Of Electronics Kyungpook National University

• Lee Gil

  Department Of Information And Communications Gist:(present Office)sc Management Center Sumsung Elect

• Lee Gil

  Department Of Electrical Engineering University Of Texas At Dallas

• Kwon Dae-hyuk

  School Of Electronic And Information Engineering Kyungil University

• KIM Howoon

  Department of Electronics, Kyungpook National University

• SEO Hwa-Il

  School of Information Technology, Korea University of Technology and Education

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