Development of a Dual Inductively Coupled Plasma Source for Direct and Remote Plasma Generation in a Reactor

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概要

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• A dual inductively coupled plasma (ICP) system consists of a remote ICP reactor with small volume and a main ICP reactor with a substrate. Two ICP antennas were connected in parallel and a variable capacitor ($C_{\text{var}}$) was installed in series at the end of the main ICP antenna. By adjusting the capacitance of the variable capacitor, the plasma densities in the remote region and the main region are controlled. For the remote region, the plasma was considerably changed such that it had high density and the electron temperature was higher than that in the main region because of its small volume. As such, reactive species in the remote region appeared to be effectively generated. The dual ICP system was applied to Si etching. It was observed that Si etch rate increased by 20% as the plasma density in the remote region increased, even though the plasma density in the main region decreased. This might be understood by considering the role of the remote ICP as a radical generator.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-02-15

著者

• LEE KYUNG

  Department of Pediatrics, The Catholic University of Korea

• Lee Kyung

  Department Of Anesthesia And Pain Medicine Gachon University Of Medicine And Science Gil Medical Cen

• Lee Kyung

  Department Of Physics Korea Advanced Institute Of Science And Technology

• Chang Hong

  Department Of Nutrition And Food Hygiene School Of Public Health Tianjin Medical University

• Uhm Saehoon

  Department of Physics, Korea Advanced Institute of Science and Technology, Daejon 305-701, Republic

• Chung Chin

  Division of Electrical and Computer Engineering, HanYang University, Seongdong-gu, Seoul 133-791, Re

• Uhm Saehoon

  Department Of Physics Korea Advanced Institute Of Science And Technology

• Chang Hong

  Department Of Physics Korea Advanced Institute Of Science And Technology

• Chang Hong

  Department Of Hematology West China Hospital Sichuan University

• Chung Chin

  Division Of Electrical And Computer Engineering Hanyang University

• Lee Kyung

  Department Of Agricultural Chemistry Division Of Applied Life Science Gyeongsang National University

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