Correction of Critical Dimension Uniformity on a Wafer by Controlling Back-Surface Transmittance Distribution of a Photomask
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-09-15
著者
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PARK Jong
Department of Internal Medicine, Chonnam National University Hospital
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Lee Dong
Samsung Heavy Industries Co. Ltd. Koje Shipyard
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Cha Byung-cheol
Samsung Electronics Co. Ltd.
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Kim Soon
Samsung Electronics Co. Ltd.
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Choi Sung-woon
Samsung Electronics Co. Ltd.
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PARK Jin-Hong
Samsung Electronics Co., Ltd.
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KIM Seong-Yoon
Samsung Electronics Co., Ltd.
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