Simulation of Anisotropic Chemical Etching of Single Crystalline Silicon using Cellular-Automata
スポンサーリンク
概要
著者
-
ISONO Yoshitada
Ritsumeikan Univ.
-
TABATA Osamu
Ritsumeikan University
-
Isono Yoshitada
Ritsumeikan University
-
Ehrmann K.
University Of Freiburg
-
KAKINAGA Takamitsu
Ritsumeikan University
-
BABA Noriaki
Ritsumeikan University
-
KORVINK J.
University of Freiburg
関連論文
- Fatigue Characteristics of the Si Moveable Comb Inserted into MEMS Optical Devices(Optical Passive Devices and Modules, Recent Progress in Optoelectronics and Communications)
- X-ray Mask with SiC Membrane for LIGA Process
- Selectivity Control of Mask Material for XeF_2 Etching Using UV light Exposure
- Monolithic Pyroelectric Infrared Image Sensor Using PVDF Thin Film (特集:特殊イメ-ジング技術)
- Tensile Testing of Polycrystalline Silicon Thin Films Using Electrostatic Force Grip
- Micor Fluxgate Magnetic Sensor Interface Circuits Using △Σ Modulation
- Simulation of Anisotropic Chemical Etching of Single Crystalline Silicon using Cellular-Automata
- Some Effects of Over Coated Metal for the Mechanical Property Improvement of Bond Bridge of Porous Metal Bonded Diamond Wheel
- Effect of Potassium Ion on Anisotropy of TMAH (特集:立体的微細加工)
- 形状剛性変化型の振動式加速度センサ
- 3-Dimensional Microstructure Fabrication using Multiple Moving Mask Deep X-ray Lithography Process (特集:立体的微細加工)
- SiO_2 Etching Rate Control of TMAH