Electrical Stress Effect on Poly-Si Thin Film Transistors Fabricated by Metal Induced Lateral Crystallization

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-08-15

著者

• Jeon Yoo-chan

  Process Group Advanced Technology Laboratory Lg Semicon Co. Ltd.

• Joo Seung-Ki

  Division of Materials Science and Engineering Seoul National University

• Lee Byung-Il

  Division of Materials Science and Engineering, Seoul National University

• Ihn Tae-hyung

  Division Of Materials Science Ancl Engineering College Of Engineering Seoul National University

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• Electrical Stress Effect on Poly-Si Thin Film Transistors Fabricated by Metal Induced Lateral Crystallization

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