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Research Institute For Nano-devices Kochi University Of Technology | 論文
- Crystallographic Orientations of Mg0 Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition
- Silver-Induced 3 × 3 Phase on 6H-SiC(0001)√ × √ Surface
- Direct Observation of Strained Layer Formation at the Initial Stage of In Thin Film Growth on Si(100)
- Preparation of PbTiO_3 Thin Films by Ion- and Photoassisted Evaporation
- Preparation and Characterization of Pb-Based Ferroelectric Thin Films : Thin Films
- Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
- Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma
- Simple Direct Monitoring of SiH_3 Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy
- Effect of Ion Trapping Films on the Electrooptic Characteristics of Polymer-Stabilized Ferroelectric Liquid Crystal Display Exhibiting V-Shaped Switching
- Influence of the Surface Alignment Conditions and the Polymer Stabilization on the Electrooptic Characteristics of Ferroelectric Liquid Crystal Displays Exhibiting Half-V Switching : A Comparison of Photoalignment and Rubbing Technique : Structure and Mec
- A $128\times 96$ Pixel Stack-Type Color Image Sensor: Stack of Individual Blue-, Green-, and Red-Sensitive Organic Photoconductive Films Integrated with a ZnO Thin Film Transistor Readout Circuit
- Estimation of Frequency Accuracy and Stability in a Diode Laser-Pumped Rubidium Beam Atomic Clock Using a Novel Microwave Resonant Method
- Positive Bias Instability of Bottom-Gate Zinc Oxide Thin-Film Transistors with a SiOx/SiNx-Stacked Gate Insulator
- Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional X-ray Diffraction Measurement
- Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional X-ray Diffraction Measurement
- Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias
- Effect of Pulsed Substrate Bias on Film Properties of SiO2 Deposited by Inductively Coupled Plasma Chemical Vapor Deposition
- Frequency Control Method of Magnetostatic Wave Oscillators Using External pin Diode Circuits
- Simulation of Magnetostatic Wave Envelope Soliton Propagation in Yttrium Iron Garnet Films
- (100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition