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NTT Microsystem Integration Laboratories | 論文
- Molecular Beam Epitaxy Growth of ZnTe Epilayers on c-Plane Sapphire
- Operation of Ultra-Low Leakage Regulator Circuits with SOI and Bulk Technologies for Controlling Wireless Transceivers
- 9 UV Photolysis Products of Hydantoin and 5-Substituted Hydantoin Molecules : Relevance to Their Prebiotic Significance(General Contnbutions,The 37^ Annual Meeting of the SSOEL-Japan)
- Phase Demodulation of DPSK Signals Using Dual-Bus Coupled Silicon Micro-Ring Resonator
- Integration of Silicon Nano-Photonic Devices for Telecommunications
- Selective Removal of Dry-Etching Residue Derived from Polymer Sacrificial Layer for Microelectromechanical-System Device Fabrication
- Low-Temperature Silicon Oxidation with Very Small Activation Energy and High-Quality Interface by Electron Cyclotron Resonance Plasma Stream Irradiation
- Third-Harmonic Envelope Feedback Method for High-Efficiency Linear Power Amplifiers
- Third-Harmonic Envelope Feedback Method for High-Efficiency Linear Power Amplifiers
- Removal of Gold Oxide by Low-Temperature Hydrogen Annealing for Microelectromechanical System Device Fabrication
- Characterization of Air-Gap Sealing with Organic Dielectric Using Spin-Coating Film Transfer and Hot-Pressing Technology
- Molecular Beam Epitaxy Growth of ZnTe Epilayers on c-Plane Sapphire
- Synchronized Multiple-Array Vibrational Device for Microelectromechanical System Electrostatic Energy Harvester
- Effect of Ground-Wall Structure in Capacitive Fingerprint Sensor on Electrostatic Discharge Tolerance
- The Effect of Thick Interconnections Formed by Gold Electroplating on the Characteristics of Metal–Oxide–Semiconductor Field-Effect Transistors
- Practical High-Resistivity Silicon-on-Insulator Solution for Spiral Inductors in Radio-Frequency Integrated Circuits
- Novel Packaging Technology for Microelectromechanical-System Devices
- InP-Based Planar-Antenna-Integrated Schottky-Barrier Diode for Millimeter- and Sub-Millimeter-Wave Detection
- Ultra-Low Noise Photonic Local Oscillator at 100 GHz
- Evaluation of Finished Extreme Ultraviolet Lithography (EUVL) Masks Using a EUV Microscope