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Mitsubishi Materials Silicon Corporation | 論文
- Measurement of Edge Density Profiles and Fluctuations in the H-Mode Discharge of the Compact Helical System (CHS) with a Thermal Neutral Lithium Beam Probe
- 27aC26P 負イオンプラズマ中のイオン音波slowモードの支配的伝播(プラズマ基礎・応用)
- 27pA03P 3成分イオンプラズマ中のイオン音波伝播特性(プラズマ基礎・応用)
- 28p-C-2 ECRプラズマ中のイオンおよび中性原子温度の測定
- 24aD-7 Ar/SF_6プラズマ中のイオン音波伝播
- 25aYG-11 イオンバーストを用いた多種イオンプラズマ測定
- 27pA04P 2種類の負イオンを含む多成分系プラズマ中のイオン音波(プラズマ基礎・応用)
- Simulation of Light Scattering by a Particle on a Film-Coated Substrate Using Coupled-Dipole Method
- Light Scattering by Submicron Particles on Film-Coated Wafers
- Electron Cyclotron Wave Plasma Production Using a Concave Lens
- 28a-Q-12 マイクロ波凹レンズを用いた大口径高密度プラズマの生成
- Effect of Electromagnetic Waves Propagating in the Periphery of Electron Cyclotron Resonance Plasma on the Uniformity
- Three-Dimensional Simulation of Microwave Propagation in an Electron Cyclotron Resonance Plasma
- One-Dimensional Simulation of Microwave Propagation in Electron Cyclotron Resonance Plasmas
- Characteristics of Very High Frequency Plasma Produced with Ladder-Shaped Electrode at High Pressure
- Characteristics of Very-High-Frequency-Excited SiH_4 Plasmas using a Ladder-Shaped Electrode
- Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode
- Production of Inductively Coupled RF Plasma Using a Ladder-Shaped Antenne
- Adsorption and Desorption of Metallic Impurities on Si Wafer Surface in SC1 Solution
- Radial Distribution of Oxygen Precipitates in Czochralski Silicon Single Crystals