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Mitsubishi Electric Corp. Hyogo Jpn | 論文
- Study of Beam Divergence of a Low-Energy (1-3 keV) Ion Source
- Optimization Studies on the Plasma Position Control System in TORIUT-4 Tokamak
- Computer Simulation of Ion Beam Extraction by Finite Element Method
- Two Dimensional Semiconductor-Based Photonic Crystal Slab Waveguides for Ultra-Fast Optical Signal Processing Devices(Photonic Crystals and Their Device Applications)
- Nonlinear Optical Properties of Si(111)7×7 : Intensity Behavior of Second Harmonies from the Polarizations along [21^^-1^^-] and [011^^-] Axes
- Thermal Desorption Spectroscopy of (Ba, Sr)TiO_3 Thin Films Prepared by Chemical Vapor Deposition
- Preparation of (Ba, Sr)TiO_3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
- Step Coverage and Electrical Properties of (Ba, Sr)TiO_3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)_2 ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Dielectric Relaxation of (Ba, Sr)TiO_3 Thin Films
- Dielectric Properties of (Ba_xSr_)TiO_3 Thin Films Prepared by RF Sputtering for Dynamic Random Access Memory Application ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Proposal and Preliminary Experiments of Indoor Optical Wireless LAN Based on a CMOS Image Sensor with a High-Speed Readout Function Enabling a Low-Power Compact Module with Large Uplink Capacity ( Recent Progress in Optoelectronics an
- Study of α-Sexithienyl Thin Film by Polarized Near Edge X-ray Absorption Fine Structure
- Preparation and Characterization of 3,4,9,10-Perylenetetracarboxylic dianhydride (PTCDA) Films Deposited by Organic Molecular Beam Deposition Method
- Molecular Oriented Thin Film of Biphenyl-4,4'-dithiol Fabricated by Molecular Beam Deposition Method
- Preparation of a-Si:H/a-Si_C_x:H Superlattices
- Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
- Effect of H_2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
- Two Components of Light-Induced Photoconductivity Decays in a-Si:H
- Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
- Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method