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Laboratory Of Advanced Science And Technology For Industry Himeji Institute Of Technology | 論文
- Fabrication of Spiral Micro-Coil Utilizing LIGA Process(Recent Advances in Materials and Processing [II])
- Stress Changes and Stability of Sputter-Deposited Mo/B_4C Multilayer Films for Extreme Ultraviolet Mirrors
- 633 Microfabrication of Microstructure object by plastic injection molding
- Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors
- Characterization of Hard Diamond-Like Carbon Films Formed by Ar Gas Cluster Ion Beam-Assisted Fullerene Deposition
- Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU
- Contrast Measurement of Reflection Masks Fabricated from Cr and Ta Absorbers for Extreme Ultraviolet Lithography
- Near Edge X-Ray Absorption Fine Structure Study for Optimization of Hard Diamond-Like Carbon Film Formation with Ar Cluster Ion Beam
- Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
- 632 Current Status of LIGA Process at "NewSUBARU"
- Effects of Improved Microchannel Structures on the Separation Characteristics of Microchip Capillary Electrophoresis
- 612 Fabrication of plastic microchip for electrophoresis using UV polymerization
- Precise Micro Pattern Replication by Hot Embossing(Recent Advances in Materials and Processing [II])
- Development of Three Dimensional LIGA Process to Fabricate Spiral Microcoil
- Fabrication of Mold Master for Spiral Microcoil Utilizing X-Ray Lithography of Synchrotron Radiation
- Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
- Study on Critical Dimension of Printable Phase Defects Using an Extreme Ultraviolet Microscope: II. Definition of Printable Threshold Region for Hole-Pit Programmed Defects
- Control of Roughness in Mo/Al Multilayer Film Fabricated by DC Magnetron Sputtering
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography