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Hyundai Electronics Ind. Co. Ltd. Kyoungki‐do Kor | 論文
- A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials
- Synthesis and Characterization of Alicyclic Polymers with Hydrophilic Groups for 193 nm Single-Layer Resist
- The Study on the Reaction Mechanism of HDP-SiOF Film and Inter-Metal-Dielectric Application
- The Study on the Reaction Mechanism of HDP-SiOF Film and Inter-Metal-Dielectric Application
- Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology
- Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology
- Production-Worthy Full Process Integration of Ta_2O_5 Capacitor Technology
- ED2000-54 / SDM2000-54 Microprocessor Technologies beyond GHz
- ED2000-54 / SDM2000-54 Microprocessor Technologies beyond GHz
- Device Performance Improvement Based on Transient Enhanced Diffusion Suppression in the Deep Sub-Quarter Micron Scale
- Device Performances Improvement Based on TED Suppression in Deep Sub-Quarter Micron Regime
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Sub-100nm Lithographic Performance of Novel Electron Beam Resist
- Novel Organic Bottom Antireflective Coating Materials for 193nm Lithography
- Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer