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Hitachi Ltd. Ibaraki Jpn | 論文
- Molecular Dynamics Simulation of Tensile Deformation of Iron Single Crystals Including Thermal Effect
- Crystalline Fraction of Microcrystalline Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Silane Flow
- Negative Ions in 13.56 MHz Discharge of SF_6 Gas in a Planar Diode
- Mass Spectrometrie Observation of Decomposition Products SF_x (x=1,2) in SF_6 Discharge at 13.56 MHz
- Determination of T Cell Epitopes of a Japanese Ceder Pollen Allergen, Cry j 2
- Episcleritis Associated with Pigmentary Retinal Degeneration in an HTLV-I Carrier
- In Situ Formation of Ohmic Contact Electrodes of Cu and Ag onto the Fractured Surface of (Bi, Pb)-Sr-Ca-Cu-O Ceramics
- Non-stoichiometry and Antiferromagnetic Phase Transition of NaCl-type CrN Thin Films Prepared by Reactive Sputtering
- Molecular Dynamics Study of Stress Effects on Raman Frequencies of Crystalline Silicon
- Charge Disproportionation in Highly One-Dimensional Molecular Conductor TPP[Co(Pc)(CN)_2]_2(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Giant Negative Magnetoresistance Reflecting Molecular Symmetry in Dicyano (phthalocyaninato) iron Compounds (Condensed Matter: Electronic Structure, Electrical, Magnetic and Optical Properties)
- Contribution of Degenerate Molecular Orbitals to Molecular Orbital Angular Momentum in Molecular Magnet Fe(Pc)(CN)_2(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- VGAプロジェクタ用MOS-NCAP反射型素子
- Si Molecular Beam Epitaxial Growth over an Atomic-Layer Boron Adsorbed Si(001) Substrate and Its Electrical Properties
- Suppression of Transient Enhanced Diffusion by Local-Oxidation-Silicon-Induced Stress
- Suppression of Transient Enhanced Diffusion by LOCOS Induced Stress
- Purification and Properties of Acetylacetoin Synthase form Bacillus sp. YUF-4
- Microstructural Observation of Si_Ge_x Thin Films Prepared by Pulsed Ion-Beam Evaporation
- Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
- Fabrication of Micro-Marks for Electron-Beam Lithography