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Department of Materials Science and Engineering, Korea Advanced institute of Science and Technology | 論文
- Atomic Layer Deposition of TiN Films by Alternate Supply of Tetrakis (ethylmethylamino)-Titanium and Ammonia
- Diffusional Solidification Behavior in 304 Stainless Steel
- Reaction Characteristics between Cu Thin Film and RF Inductively Coupled Cl_2 Plasma without/with UV Irradiation
- Effects of F^+ Implantation on the Characteristics of Poly-Si Films and Low-Temperature n-ch Poly-Si Thin-Film Transistors
- Dielectric Properties and Phase Transition of 0.5[(1-x)PbYb_Nb _O_3-xPbTiO_3]-0.5PbZrO_3 Solid Solution
- High Power Performance of Nonbiased Optical Bistable Devices Using Multiple Shallow Quantum Well p-i-n-i-p Diodes
- Effects of the Partial Pressure of Copper(I)Hexafluoroacetylacetonate Trimethylvinylsilane on the Chemical Vapor Deposition of Copper
- Effects of the Annealing in Ar and H_2/Ar Ambients on the Microstructure and the Electrical Resistivity of the Copper Film Prepared by Chemical Vapor Deposition
- Effects of PbO Content on the Microstructure and Dielectric Constant of 0.8Pb(Zn_Nb_)O_3-0.1BaTiO_3-0.1PbTiO_3
- Characteristics of Indium Bump for Flip-Chip Bonding Used in Polymeric-Waveguide-Integrated Optical Interconnection Systems
- Polarization Properties of Vertical-Cavity Surface-Emitting Lasers with Various Patterns in Tilted Pillar Structures
- Effect of ECAP Strain on Deformation Behavior at Low Temperature Superplastic Regime of Ultrafine Grained 5083 Al Alloy Fabricated by ECAP
- Removal of mixed contaminants by Fe^0-based biobarrier in flow-through columns using recycled waste materials
- Preoxide-Controlled Oxidation for Very Thin Oxide Films
- IS-87 The relationship between the intensity of intra-amniotic inflammation and the presence and severity of histologic chorioamnionitis in preterm births(Group11 Perinatology3,International Session)
- Influence of La_Sr_CoO_3 Heterostructure Electrodes on Pb(Zr, Ti)O_3 Thin Film Properties
- Effect of Creep Deformation on Creep-Fatigue Damage in Lamellar TiAl Alloy
- Crystal Structure and B-Site Ordering in Antiferroelectric Pb(Mg_W_)O_3, Pb(Co_W_)O_3 and Pb(Yb_Nb_)O_3
- The Effects of the Preparation Conditions and Heat-Treatment Conditions of Pt/Ti/SiO_2/Si Substrates on the Nucleation and Growth of Pb(Zr, Ti)O_3 Films
- Effect of LaNiO_3 Top Electrode on the Resistance of Pb(Zr,Ti)O_3 Ferroelectric Capacitor to Hydrogen Damage and Fatigue