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Department of Materials Science, Kitami Institute of Technology | 論文
- Simultaneous Direct Determination of Aluminum, Calcium and Iron in Silicon Carbide and Silicon Nitride Powders by Slurry-Sampling Graphite Furnace AAS
- Isotope Dilution Analysis of Selenite and Selenate in Natural Water Using Microwave-Induced Nitrogen Plasma Mass Spectrometry
- Determination of Ultra-Trace Levels of Calcium in Steel by Graphite Furnace Atomic Absorption Spectrometry
- Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer
- Pentane Isomerization over Molybdenum Oxide Prepared by H_2 Reduction of a Hydrogen Molybdenum Bronze
- Effect of the Flow Rate of H_2 in the Reduction Process on the Physical and Catalytic Properties of H_2-Reduced Pt/MoO_3
- Catalytic Properties of Ni-MoO_3 for the Isomerization of Heptane
- Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2 + H_2O Mixed Gas
- Effect of Substrate Temperature on Epitaxial Orientation of Rh Thin Films Sputtered on A-Plane Sapphire
- Oxidation and Morphology Change of Ru Films Caused by Sputter Deposition of Ta_2O_5 Films
- Effects of Sputtering Parameters on the Formation of Single-Oriented (002) Ti Film on Si
- Epitaxial Growth of (001)ZrN Thin Films on (001)Si by Low Temperature Process
- Difference in Thermal Degradation Behavior of ZrO_2 and HfO_2 Anodized Capacitors
- Crystal Orientation Change of Ni Films by Sputtering in Ar-N_2 Mixed Gases
- Improvement of the Crystal Orientation and Surface Roughness of Ru Thin Films by Introducing Oxygen during Sputtering
- Realization of Sequential Epitaxial Growth of Cu/HfN Bilayered Films on (111) and (001) Si
- Epitaxial Ir Thin Film on (001) MgO Single Crystal Prepared by Sputtering
- Preparation of Low-Resistivity α-Ta Thin Films on (001) Si by Conventional DC Magnetron Sputtering
- Capacitor Property and Leakage Current Mechanism of ZrO_2 Thin Dielectric Films Prepared by Anodic Oxidation
- Highly Texrured (100) RuO_2/(001) Ru Multilayers Preparedly by Sputtering