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Department of Electrical and Computer Engineering, Faculty of Technology, Kanazawa University | 論文
- ANALYSIS OF SEA ICE COMPACTNESS BY IMAGE PROCESSING
- Studies on Positive Ion Behavior in Reactive Sputtering of Yttria-Stabilized Zirconia (YSZ)
- A Sharp Photocurrent Enhancement in Photoelectrochemical Cells with a Photocathode Sensitized by Dye Films of Rhodamine-C_ and Methylviolet-C_ Prepared by Langmuir-Blodgett Techniques
- MEASUREMENT OF FALLING MOTION OF SNOWFLAKES USING CCD CAMERA
- Panel-Type Semiconductor Optical Modulator Using Electron Depleting Absorption Control
- Target for a Pb(Zr,Ti)O_3 Thin Film Deposited at a Low Temperature Using a Quasi-Metallic Mode of Reactive Sputtering
- Noninvasive, Continuous Evaluation of Peripheral Vascular Resistance in Humans
- Evaluation of Optical Absorption Coefficients of a-SiN:H Films by Photothermal Deflection Spectroscopy(PDS) : Photoacoustic Spectroscopy
- Room-Temperature Synthesis of ZnS:Mn Films by H_2 Plasma Chemical Sputtering
- Magneto-Optical Characteristics of Bi-Substituted Rare-Earth Iron Garnet Films Prepared by Laser Ablation
- Preparation of Pb(Zr, Ti)O_3 Films on Si Substrate by Laser Ablation
- Influence of Laser Fluence on Structural and Ferroelectric Properties of Lead-Zirconate-Titanate Thin Films Prepared by Laser Ablation : Thin Films
- Relationship between Electrical Conductivity and Charged-Dangling-Bond Density in Nitrogen- and Phosphorus-Doped Hydrogenated Amorphous Silicon
- Nonvolatile Memory Based on Phase Transition in Chalcogenide Thin Film
- Low-Temperature Synthesis of Diamond Films in Thermoassisted RF Plasma Chemical Vapor Deposition
- Growth Mechanism of ZnS:Mn Films Obtained by Hydrogen Plasma Sputtering and Its Application to a Thin-Film Electroluminescent Device