スポンサーリンク
Department of Chemical Engineering, University of Tokyo | 論文
- Dynamic Behavior of Dragonfly Wings
- ラット卵巣におけるグラニュリン前駆体蛋白(アクログラニン)の卵子特異的な発現
- Single-Crystalline Photochromism of Bis[2-(aminomethyl)pyridine]platinum(II) Chloride Monohydrate
- METHOD OF EVALUATING EARTHQUAKE SAFETY OF RC BRIDGE SYSTEM BASED ON RELIABILITY THEORY
- Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C_4F_6, by Plasma Enhanced Chemical Vapor Deposition
- Immunoreactive (ir) -Transforming Growth Factor (TGF) -β in Rat Corpus Luteum: ir-TGFβIs Expressed by luteal Macrophages
- Chemical Bonding States and Band Alignment of Ultrathin AlOxNy/Si Gate Stacks Grown by Metalorganic Chemical Vapor Deposition
- -1357- CORONARY RISK FACTERS FOR SILENT MYOCARDIAL ISCHEMIA IN DIABETIC PATIENTS(PROCEEDINGS OF THE 59th ANNUAL SCIENTIFIC MEETING OF THE JAPANESE CIRCULATION SOCIETY)
- FREQUENCY OF CORONARY VASOSPASUM ASSESSED BY PROVOCATION TESTS IN SILENT MYOCARDIAL ISCHEMIA OF DIABETIC PATIENTS
- The August 1998 Flood Disaster in the Abukuma River Basin
- Application of Electroforming Process to Bulk Amorphous Ni-W Alloy
- マウス20α-水酸化ステロイド脱水素酵素遺伝子のクローニングとその妊娠期におけるmRNA発現
- Inhibin α-Subunit mRNA Is Expressed in the Corpus Luteum of the Pregnant Mare
- Novel Precursors for SiCH Low-$k$ Caps beyond the 22 nm Node: Reactions of Silacyclopentane Precursors in the Plasma-Enhanced Chemical Vapor Deposition Process and Structural Analyses of SiCH Films
- Decrease in Deposition Rate and Improvement of Step Coverage by CF_4 Addition to Plasma-Enhanced Chemical Vapor Deposition of Silicon Oxide Films
- Preparation of Low-Dielectric-Constant F-Doped SiO2 Films by Plasma-Enhanced Chemical Vapor Deposition
- Preparation of Low Dielectric Constant F-Doped SiO_2 Films by PECVD
- High-Temperature Annealing Effect of Si in Group-V Ambient Prior to Heteroepitaxy of InAs in Metal--Organic Vapor Phase Epitaxy
- Involvement of Prostaglandins in Suppression of Gonadotropin-Releasing Hormone Pulse Generator Activity by Tumor Necrosis Factor-α
- Metalorganic Vapor Phase Epitaxy of GaAs with AlP Surface Passivation Layer for Improved Metal Oxide Semiconductor Characteristics