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Department Of Materials Science Shonan Institute Of Technology | 論文
- Variation in Preferred Orientations of TiN Thin Films Prepared by Ion Beam Assisted Deposition
- Consideration of Deformation of TiN Thin Films with Preferred Orientation Prepared by Ion-Beam-Assisted Deposition
- Mechanical Properties of TiN Films with the Preferred Orientations by Nano-Indentation Method
- Structural Analysis of a Carbon Nitride Film Prepared by Ion-Beam-Assisted Deposition
- Influence of Deposition Temperatures on Bonding State and Microstructure of Carbon Nitride Thin Films Prepared by Ion-Beam-Assisted Deposition
- 5 nm Gate Oxide Grown by Rapid Thermal Processing for Future MOSFETs
- Control of Surface Reaction on Highly Accurate Low-k Methylsilsesquioxane Etching Process : Nuclear Science, Plasmas, and Electric Discharges
- Magnetic Neutral Loop Discharge (NLD) Plasma and Application to SiO_2 Etching Process
- Dry Etch Process in Magnetic Neutral Loop Discharge Plasma
- Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash Electrically Erasable and Programmable ROMs
- Highly Reliable Flash Memories Fabricated by in-situ Multiple Rapid Thermal Processing (Special Section on High Speed and High Density Multi Functional LSI Memories)
- Low-Temperature Processing of Highly Oriented Pb(Zr_XTi_)O_3 Thin Film with Multi-Seeding Layers
- Low-Temperature Processing of Ferroelectric Pb(Zr_Ti_)O_3 Thin Film from Molecular-Designed Alkoxide Precursor Solution
- Effect of Mode-Mixing on Microwave Reflectometry in the Tokamak and Helical Devices
- Application of Maximum Entropy Method for Data Processing of Microwave Reflectometry
- Electronic States and Energy Transfer in PbI_2 Clusters Dispersed in CdI_2 Crystals
- Time-Resolved Photoluminescence of PbI_2 Clusters Dispersed in CdI_2 Crystals
- Excitonic States of Pb Ion Clusters in Pb_Cd_xI_2 Solid Solutions Studied with Time-Resolved Emission Spectra
- Structural and Optical Properties of In-Plane Ordered Metallo-Phthalocyanine Thin Films Formed on Sapphire by Organic Molecular Beam Deposition
- Study of Deposition Process in Modulated RF Silane Plasma ( Plasma Processing)