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Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University | 論文
- Microcrystalline SiC Films Grown by Electron Cyclotron Resonance Chemical Vapor Deposition at Low Temperatures
- Very Low Temperature Deposition of Polycrystalline Si Films Fabricated by Hydrogen Dilution with Electron Cyclotron Resonance Chemical Vapor Deposition
- A Quasi-planar Thin Film Field Emission Diode
- Improvement of Luminescent Uniformity via Synthesizing the Carbon Nanotubes on a Fe-Ti Co-deposited Catalytic Layer
- Field Emission Improvement from Pillar Array of Aligned Carbon Nanotubes
- Improvement of Breakdown Field of Carbon Nanotubes by a Ti-Capping Layer on Catalyst Nanopaticles
- Constraining the Direction of Carbon Nanotubes by Oxide Capping Layer
- Fabrication and Characterization of Lateral Field Emission Device Based On Carbon Nanotubes
- A Field-Emission Device with Novel Self-Focus Gate Structure
- A New Method to Correct Capacitance of High-leakage Ultra-thin Gate Dielectric
- Growth Behavior of Y_1Ba_2Cu_3O_ Superconducting Thin Films Using Laser Ablation Technique
- Reactive Ion Pretreatment Technique to Improve the Ashing Resistance of Low Dielectric Constant High Carbon Content Polymer
- Threshold Voltage Instability in nMOSFETs with HfSiO/SiO_2 High-k Gate Stacks
- Reactively Sputtered Amorphous TaSi_xN_y Films Serving as Barrier Layer Against Copper Diffusion
- Influence of Cooling Rate on Electrical Properties of Zinc Oxide-Based Varistors
- Optimum Conditions for Novel One-Step Cleaning Method for Pre-Gate Oxide Cleaning Using Robust Design Methodology
- Thickness and Stress Polarity Effects on the Reliability of the Low Thermal Budget Polyoixdes : Semiconductors
- The feasibility of ^C-methionine-PET in diagnosis of solitary lung nodules/masses when compared with ^F-FDG-PET
- Chemically Vapor Deposited Cu Films on Ar-Plasma-Treated TiN Substrate(Surfaces, Interfaces, and Films)
- TED-AJ03-388 CONVERGENCE ACCELERATION BY RELAXATION FACTOR DETERMINATION FOR TURBULENT PIPE FLOW COMPUTATION