Reactive Ion Pretreatment Technique to Improve the Ashing Resistance of Low Dielectric Constant High Carbon Content Polymer
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-07-15
著者
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Yang J‐y
National Nano Device Lab. Hsinchu Twn
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Tsai J‐y
National Chiao Tung Univ. Hsinchu Twn
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CHANG Kow-Ming
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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YANG Ji-Yi
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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CHANG Yu-Hsun
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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TSAI Jung-Yu
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Chang Kow-ming
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Chang Kow-ming
Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University And
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Chang Yu-hsun
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Tsai Jung-yu
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
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Yang Ji-yi
Department Of Electronics Engineering And Institute Of Electronics National Chiao-tung University
関連論文
- Reactive Ion Pretreatment Technique to Improve the Ashing Resistance of Low Dielectric Constant High Carbon Content Polymer
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