Suppression of Fluorine Impurity in Blanket Chemical Vapor Deposited Tungsten Film for Via Fills with A Novel Two-step Deposition Technique
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-04-15
著者
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FU Chao-Ming
Department of Physics, National Kao Hsiung Normal University
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CHANG Kow-Ming
Department of Electronics Engineering and Institute of Electronics, National Chiao-Tung University
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Yeh Ta-hsun
Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University An
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Chang Kow-ming
Department Of Electronic Engineering And Institute Of Electronics National Chiao Tung University And
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Fu C‐m
Department Of Physics National Kaohsiung Normal University
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Fu Chao-ming
Department Of Physics National Kao Hsiung Normal University
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LAIN Kuen-Der
Department of Physics, National Kaohsiung Normal University
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Lain Kuen-der
Department Of Physics National Kaohsiung Normal University
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- Thermal Stability of Amorphous-like WN_x/W Bilayered Diffusion Barrier for Chemical Vapor Deposited-Tungsten/p^+-Si Contact System
- Suppression of Fluorine Impurity in Blanket Chemical Vapor Deposited Tungsten Film for Via Fills with A Novel Two-step Deposition Technique
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