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Central Research Laboratory, HITACHI, Ltd. | 論文
- Thermal Stability of a RuO_2 Electrode Prepared by DC Reactive Sputtering
- Hydrogen Reduction Properties of RuO_2 Electrodes
- X-Ray Photoelectron Spectroscopy Using A Focused 300 μm-Diameter X-Ray Beam
- A Novel Method of Beryllium Window Protection in a Plasma Focus Soft X-Ray Source
- Vibration of Beryllium Foil Window Caused by Plasma Particle Bombardment in Plasma Focus X-Ray Source
- Photon-Stimulated Ion Desorption Measurement of Organosilicon Resist Reactions in Extreme Ultraviolet Lithography
- Investigation of the Si Oxidation Process by XANES Spectroscopy Using Synchrotron Radiation
- Fine Pattern Fabrication below 100 nm with 70 kV Cell Projection Electron Beam Lithography
- 1-GHz Input Bandwidth Under-Sampling A/D Converter with Dynamic Current Reduction Comparator for UWB-IR Receiver
- 0.15μm Gate i-AlGaAs/n-GaAs HIGFET with a 13.3 S/Vcm K-Value (Special Issue on Heterostructure Electron Devices)
- テレシネ画像とEDTV-IIの適合性に関する検討: EDTV技術および一般 : 放送方式
- Residual Interface Traps at Bird's Beaks of Field Oxide Layers
- Effect of Tl and Metallic Element Addition to In-Se Based Phase-change Optical Recording Film : MEDIA
- Estimation of the Thickness of Ultrathin Silicon Nitride Films by X-Ray Photoelectron Spectroscopy
- Surface Analysis of LaB_6 Single Crystal Thermionic Emitters
- Effect of Atomic and Molecular Hydrogen Irradiation on Ge Surface Segregation during Si Molecular Beam Epitaxy
- Molecular Beam Epitaxy of Silicon-Based Heterostructure and Its Application to Novel Devices
- X-Ray Photoelectron Spectroscopy of Micrometer-Size Surface Area Using Synchrotron Radiation
- Dielectric Properties of RF-Magnetron-Sputtered (Ba, Pb)(Zr, Ti)O_3 Thin Films
- Single-Target Sputtering Process for Lead Zirconate Titanate Thin Films with Precise Composition Control