Kawakami Retsuo | Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

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概要

• Kawakami Retsuoの詳細を見る
• 同名の論文著者
• Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japanの論文著者

関連著者

• Tominaga Kikuo

  Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

• Kawakami Retsuo

  Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

• Niibe Masahito

  Laboratory of Advanced Science &Technology for Industry, Himeji Institute of Technology

• Inaoka Takeshi

  Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

• Mukai Takashi

  Nichia Chemical Industries Inc.

• Takeichi Atsushi

  Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

• Kawakami Retsuo

  Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan

• Kotaka Takuya

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan

• Kotaka Takuya

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan

• Inaoka Takeshi

  Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan

• Tominaga Kikuo

  Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan

• Mori Yuta

  Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan

• Konishi Masashi

  Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan

• Nakano Yoshitaka

  Institute Of Science And Technology Chubu University

• Nakano Yoshitaka

  Chubu Univ. Aichi Jpn

• Niibe Masahito

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan

• Niibe Masahito

  Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan

• Miyazaki Takahiro

  Hamamatsu Photonics, Hamamatsu 431-3196, Japan

• Mukai Takashi

  Nichia Corporation, Anan, Tokushima 774-0044, Japan

• Fukudome Toshiaki

  Institute of Socio-Techno Science Technology, The University of Tokushima, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

• Matsunaga Fumihiko

  PEGASUS Software, Chuo, Tokyo 104-0032, Japan

• Takasaki Toshihide

  PEGASUS Software, Chuo, Tokyo 104-0032, Japan

• Kitano Takanori

  Hamamatsu Photonics, Hamamatsu 431-3196, Japan

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著作論文

• Damage Characteristics of TiO2 Thin Film Surfaces Etched by Capacitively Coupled Radio Frequency Helium Plasmas
• Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO2 Thin Film Surfaces
• Effects of Capacitively Coupled Radio Frequency Krypton and Argon Plasmas on Gallium Nitride Etching Damage
• Characteristics of TiO2 Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas
• Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy
• Damage Analysis of n-GaN Crystal Etched with He and N2 Plasmas
• Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by Capacitively Coupled Radio Frequency Argon Plasmas (Special Issue : Dry Process)

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