Kanazawa Toru | Tokyo Institute Of Technology
スポンサーリンク
概要
関連著者
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Miyamoto Yasuyuki
Tokyo Inst. Technol. Tokyo Jpn
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Kanazawa Toru
Tokyo Institute Of Technology
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Ikeda Shunsuke
Tokyo Institute Of Technology
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TERAO Ryousuke
Tokyo Institute of Technology, Department of Physical Electronics
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IKEDA Shunsuke
Tokyo Institute of Technology, Department of Physical Electronics
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Yonai Yoshiharu
Tokyo Institute Of Technology
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KATO Atsushi
Tokyo Institute of Technology
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Saito Hisahi
Department Of Physical Electronics Tokyo Institute Of Technology
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KANAZAWA Toru
Tokyo Institute of Technology, Department of Physical Electronics
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WAKABAYASHI Kazuya
Tokyo Institute of Technology, Department of Physical Electronics
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SAITO Hisashi
Tokyo Institute of Technology, Department of Physical Electronics
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MIYAMOTO Yasuyuki
Tokyo Institute of Technology, Department of Physical Electronics
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FURUYA Kazuhito
Tokyo Institute of Technology, Department of Physical Electronics
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Furuya Kazuhito
Tokyo Institute Of Technology Dept. Of Physical Electronics
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Kanazawa Toru
Department Of Physical Electronics Tokyo Institute Of Technology
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Ikeda Shunsuke
Department Of Physical Electronics Tokyo Institute Of Technology
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Terao Ryousuke
Department Of Physical Electronics Tokyo Institute Of Technology
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Wakabayashi Kazuya
Tokyo Institute Of Technology Department Of Physical Electronics
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Yonai Yoshiharu
Department Of Physical Electronics Tokyo Institute Of Technology
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Furuya Kazuhito
Tokyo Institute Of Technology
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Kato Atsushi
Department Of Physical Electronics Tokyo Institute Of Technology
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Saito Hisashi
Tokyo Inst. Technol. Tokyo Jpn
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Miyamoto Yasuyuki
Tokyo Institute of Technology
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Yonai Yoshiharu
Tokyo Institute of Technology, Department of Physical Electronics, Meguro, Tokyo 152-8552, Japan
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Kanazawa Toru
Tokyo Institute of Technology, Department of Physical Electronics, Meguro, Tokyo 152-8552, Japan
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Ikeda Shunsuke
Tokyo Institute of Technology, Department of Physical Electronics, Meguro, Tokyo 152-8552, Japan
著作論文
- Submicron InP/InGaAs Composite-Channel Metal-Oxide-Semiconductor Field-Effect Transistor with Selectively Regrown n^+-Source
- Erratum: “InP/InGaAs Composite Metal--Oxide--Semiconductor Field-Effect Transistors with Regrown Source and Al2O3 Gate Dielectric Exhibiting Maximum Drain Current Exceeding 1.3 mA/μm”
- Reduction of Access Resistance of InP/InGaAs Composite-Channel MOSFET with Back-Source Electrode