Nagata Makoto | Kobe Univ.
スポンサーリンク
概要
関連著者
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Nagata Makoto
Kobe Univ.
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Nagata Makoto
Kobe Univ. Kobe‐shi Jpn
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Nagata Makoto
Graduate School Of System Informatics Kobe University
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市川 浩司
(株)デンソー
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ICHIKAWA Kouji
DENSO CORPORATION
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Ichikawa Kouji
Kobe University:denso Corporation
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Ichikawa Kouji
Kobe University
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Takahashi Yuki
Kobe University
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Shimazaki Kenji
Matsushita Elect.:kobe University
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TSUJIKAWA Hiroyuki
Matsushita Elect.
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市川 浩司
(株)デンソーシステム開発部
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市川 浩司
株式会社デンソーシステム開発部
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Hirata Masaaki
Matsushita Elect.
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市川 浩司
(株)デンソー研究開発3部
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Hirano Shozo
Matsushita Elect.
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Tsuda Takahiro
Denso Corporation
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SAKURAI Yukihiko
DENSO CORPORATION
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IWASE Isao
DENSO CORPORATION
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FUKAZAWA Mitsuya
Kobe University
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MIYAHARA Shingo
Matsushita Elect.
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SATOH Kazuhiro
Matsushita Elect.
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Fukazawa Mitsuya
Kobe Univ. Kobe‐shi Jpn
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OKUMOTO Takeshi
Matsushita Electric Industrial Co. Ltd.
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Komatsu Yoshihide
Matsushita Electric Industrial Co. Ltd. Moriguchi‐shi Jpn
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Komatsu Yoshihide
Matsushita Electric Industrial Co. Ltd.
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Ishibashi Koichiro
Renesas Technology
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Nagata Makoto
Kobe University
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IKEDA Yuuichirou
Matsushita Electric Industrial Corporation
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SUMITA Masaya
Matsushita Electric Industrial Corporation
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KOMATSU Yoshihide
Matsushita (Panasonic)
著作論文
- Measurement-Based Analysis of Electromagnetic Immunity in LSI Circuit Operation
- Experimental Verification of Power Supply Noise Modeling for EMI Analysis through On-Board and On-Chip Noise Measurements(Analog Circuits and Related SoC Integration Technologies)
- An Integrated Timing and Dynamic Supply Noise Verification for Multi-10-Million Gate SoC Designs(Novel Device Architectures and System Integration Technologies)
- Dynamic Power-Supply and Well Noise Measurements and Analysis for Low Power Body Biased Circuits(Digital, Low-Power LSI and Low-Power IP)
- Substrate-Noise and Random-Variability Reduction with Self-Adjusted Forward Body Bias(Digital,Low-Power, High-Speed LSIs and Related Technologies)
- Multi-Ported Register File for Reducing the Impact of PVT Variation (Signal Integrity and Variability, VLSI Design Technology in the Sub-100nm Era)