Takeda Ryuji | Toshiba Ceramics Co. Ltd. Research And Development Center
スポンサーリンク
概要
関連著者
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Takeda Ryuji
Toshiba Ceramics Co. Ltd. Research And Development Center
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Shirai Hiroshi
Toshiba Ceramics Co. Ltd. Research And Development Center
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TAKEDA Ryuji
Toshiba Ceramics Co., Ltd., Research and Development Center
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Saito Yoshihiko
Toshiba Corp. Semiconductor Materials Engineering Dept.
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Tsuchiya Norihiko
Toshiba Corp. Semiconductor Materials Engineering Dept.
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Izunome K
Toshiba Ceramics Co. Ltd. Tokyo Jpn
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Izunome Koji
Toshiba Ceramics Co. R&d Center
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HAYASHI Kenro
Toshiba Ceramics, R & D Center
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FUKUI Hiroyuki
Toshiba Corp., Semiconductor Materials Engineering Dept.
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KUBOTA Hiroyasu
Toshiba Corp., Semiconductor Materials Engineering Dept.
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Fukui Hiroyuki
Toshiba Corp. Semiconductor Materials Engineering Dept.
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Hayashi Kenro
Toshiba Ceramics R & D Center
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Takeda R
Toshiba Ceramics Co. Ltd. Kanagawa Jpn
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Takeda Ryuji
Toshiba Ceramics Co., Ltd., Research and Development Center, 30 Soya, Hadano, Kanagawa 257, Japan
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Shirai Hiroshi
Toshiba Ceramics Co., Ltd., Research and Development Center, 30 Soya, Hadano, Kanagawa 257, Japan
著作論文
- Determination of Thickness of Thin Thermal Oxide Layers on Czochralski-Grown Silicon Wafers from their Longitudinal Optical Vibrational Mode
- Dependence of Time Dependent Dielectric Breakdown Characteristics on Mechanism for Silicon Epitaxial Growth on Misoriented Czochralski Silicon Crystal
- Determination of Thickness of Thin Thermal Oxide Layers on Czochralski-Grown Silicon Wafers from their Longitudinal Optical Vibrational Mode