Yamada Isao | Ion Beam Engineering Experimental Laboratory Kyoto University
スポンサーリンク
概要
関連著者
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YAMADA Isao
Ion Beam Engineering Experimental Laboratory, Kyoto University
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Yamada Isao
Ion Beam Engineering Experimental Laboratory Kyoto University
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Takaoka G
Kyoto Univ. Kyoto Jpn
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Takaoka Gikan
Ion Beam Engineering Experimental Laboratory Kyoto University
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Matsuo Jiro
Ion Beam Engineering Experimental Laboratory Kyoto University
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FUKUSHIMA Kazunori
Faculty of Engineering, Setsunan University
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Fukushima Kazunori
Faculty Of Engineering Setsunan University
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Matsuo J
Fujitsu Lab. Atsugi
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Akizuki Makoto
Ion Beam Engineering Experimental Laboratory Kyoto University
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Harada M
National Res. Inst. Metals Ibaraki Jpn
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Fukushima K
Institute Of Industrial Science University Of Tokyo
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Ogasawara Satoru
Microelectronics Research Center, SANYO Electric Co., Ltd.,
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Harada Mitsuaki
Microelectronics Research Center, SANYO Electric Co., Ltd.,
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Doi Atsumasa
Microelectronics Research Center, SANYO Electric Co., Ltd.,
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Harada Mitsuaki
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Doi Atsumasa
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Ogasawara Satoru
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Yamada I
Himeji Inst. Of Technol. Hyogo Jpn
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Inokawa Hiroshi
Ion Beam Engineering Experimental Laboratory Kyoto University
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TAKAGI Toshinori
Ion Beam Engineering Experimental Laboratory, Kyoto University
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Yamada I
Himeji Inst. Technol. Hyogo Jpn
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Takagi Toshinori
Ion Beam Engineering Experimental Laboratory Kyoto University
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AKIZUKI Makoto
Microelectronics Research Center, SANYO Electric Co., Ltd.
著作論文
- Observation of Initial Stage of Al Epitaxial Growth on Si(111) by Ionized Cluster Beam Deposition
- Ionized Cluster Beams : Physics and Technology
- Effects on CO Oxidation Activity of Nano-Scale Au Islands and TiO_2 Support Prepared by the Ionized Cluster Beam Method
- Epitaxial Growth of TiO_2 Rutile Thin Films on Sapphire Substrates by a Reactive Ionized Cluster Beam Method
- Low-Temperature Oxidation of Silicon by O_2 Cluster Ion Beams
- A New Low-Temperature Oxidation Technique by Gas Cluster Ion Beams
- Microhardness and Strain Depth Profiles in Nitrogen-Implanted TiO_2 Films